Chapter 1 General Information

NX-Interferom is Park Systems' proprietary metrology platform, inheriting the foundation of NX-Hybrid White Light Interferometry (WLI) and redefining interferometry with integrated Atomic Force Microscopy (AFM) technology. The term “Interferom” combines interferometry with Park's proprietary system design, representing a unique approach beyond conventional optical metrology.

NX-Interferom is a leading-edge, multi-scale metrology system that integrates Atomic Force Microscopy (AFM), Atomic Force Profiler (AFP), and White Light Interferometry (WLI) on a single platform^[1]. WLI provides high-throughput, large-area imaging, while AFM and AFP deliver sub-nanometer precision for detailed surface characterization.

Park's proven AFM technology directly enhances WLI performance by using the AFM Z-scanner for optical height scanning. This configuration ensures precise optical control and produces smooth image stitching with minimal overlap between neighboring images. A motorized dual-objective turret further adds versatility, allowing users to switch easily between wide field-of-view imaging and high-resolution imaging.

NX-Interferom delivers reliable sub-nanometer precision through Park AFM's proprietary technologies, including minimized out-of-plane motion via a decoupled XY scan system, precise orthogonality and positioning with independent dual-servo XY control, fast vertical response enabled by a high-resonance-frequency Z scanner, and extended tip life through True Non-Contact™ scanning.

NX-Interferom is designed to meet SEMI standards for seamless integration into semiconductor fabs, supporting end-to-end automation from wafer loading to measurement, analysis, and unloading^[2]. It has been adopted by major semiconductor manufacturers worldwide.